Ville Miikkulainen
Assistant Professor
Assistant Professor
T105 Chemistry and Materials
Assistant Professor
Department of Chemistry and Materials Science
Full researcher profile
https://research.aalto.fi/...
Honors and awards
JVST A Best ALD Paper Award
Award for paper "Atomic layer deposition of AlN using atomic layer annealing—Towards high-quality AlN on vertical sidewalls, by Elmeri Österlund, Heli Seppänen, Kristina Bespalova, Ville Miikkulainen and Mervi Paulasto-Kröckel, JVST A 39, 032403 (2021)"
Award or honor granted for a specific work
Department of Chemistry and Materials Science
Jun 2021
Research groups
- Atomically Controlled Materials Engineering, Assistant Professor
Publications
Stabilized Nickel-Rich-Layered Oxide Electrodes for High-Performance Lithium-Ion Batteries
Zahra Ahaliabadeh, Ville Miikkulainen, Miia Mäntymäki, Mattia Colalongo, Seyedabolfazl Mousavihashemi, Lide Yao, Hua Jiang, Jouko Lahtinen, Timo Kankaanpää, Tanja Kallio
2024
Energy and Environmental Materials
Surface and Grain Boundary Coating for Stabilizing LiNi0.8Mn0.1Co0.1O2 Based Electrodes
Zahra Ahaliabadeh, Ville Miikkulainen, Miia Mäntymäki, Seyedabolfazl Mousavihashemi, Lide Yao, Hua Jiang, Simo Huotari, Timo Kankaanpää, Tanja Kallio, Mattia Colalongo
2024
ChemSusChem
Scaling of piezoelectric in-plane NEMS : Towards nanoscale integration of AlN-based transducer on vertical sidewalls
Artem Gabrelian, Ville Miikkulainen, Glenn Ross, Mervi Paulasto-Kröckel
2024
Materials and Design
High Voltage Cycling Stability of LiF-Coated NMC811 Electrode
Princess Stephanie Llanos, Zahra Ahaliabadeh, Ville Miikkulainen, Jouko Lahtinen, Lide Yao, Hua Jiang, Timo Kankaanpää, Tanja Kallio
2024
ACS Applied Materials and Interfaces
Atomic layer deposition apparatus
Ville Miikkulainen, Hulda Aminoff, Pekka Soininen, Pekka Soininen
2023
An Atomic Layer Deposition Apparatus
Hulda Aminoff, Pekka Soininen, Pekka J Soininen, Ville Miikkulainen
2022
Ambient pressure x-ray photoelectron spectroscopy setup for synchrotron-based in situ and operando atomic layer deposition research
E. Kokkonen, Mikko Kaipio, H. E. Nieminen, F. Rehman, V. Miikkulainen, M. Putkonen, Mikko Ritala, S. Huotari, J. Schnadt, S. Urpelainen
2022
Review of Scientific Instruments
Understanding the Stabilizing Effects of Nanoscale Metal Oxide and Li-Metal Oxide Coatings on Lithium-Ion Battery Positive Electrode Materials
Zahra Ahaliabadeh, Ville Miikkulainen, Miia Mäntymäki, Seyedabolfazl Mousavihashemi, Jouko Lahtinen, Lide Yao, Hua Jiang, Kenichiro Mizohata, Timo Kankaanpää, Tanja Kallio
2021
ACS Applied Materials and Interfaces
Highly Material Selective and Self-Aligned Photo-assisted Atomic Layer Deposition of Copper on Oxide Materials
Ville Miikkulainen, Marko Vehkamäki, Kenichiro Mizohata, Timo Hatanpää, Mikko Ritala
2021
Advanced Materials Interfaces
Constructing Spacecraft Components Using Additive Manufacturing and Atomic Layer Deposition: First Steps for Integrated Electric Circuitry
Leo Nyman, Antti Kestilä, Paavo Porri, Marko Pudas, Mika Salmi, Rudolf Silander, Ville Miikkulainen, Mikko Kaipio, Esa Kallio, Mikko Ritala
2021
Journal of Aerospace Engineering
Synchronizing gas injections and time-resolved data acquisition for perturbation-enhanced APXPS experiments
Evgeniy A. Redekop, Niclas Johansson, Esko Kokkonen, Samuli Urpelainen, Felipe Lopes Da Silva, Mikko Kaipio, Heta Elisa Nieminen, Foqia Rehman, Ville Miikkulainen, Mikko Ritala, Unni Olsbye
2021
Review of Scientific Instruments
Atomic layer deposition of AlN using atomic layer annealing - Towards high-quality AlN on vertical sidewalls
Elmeri Österlund, Heli Seppänen, Kristina Bespalova, Ville Miikkulainen, Mervi Paulasto-Kröckel
2021
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
TiO2 Photocatalyzed Oxidation of Drugs Studied by Laser Ablation Electrospray Ionization Mass Spectrometry
Fred A. M. G. van Geenen, Maurice C. R. Franssen, Ville Miikkulainen, Mikko Kalervo Ritala, Han Zuilhof, Risto Kalervo Kostiainen, Michel W. F. Nielen
2019
Journal of the American Society for Mass Spectrometry
Photoassisted atomic layer deposition of oxides employing alkoxides as single-source precursors
Ville Miikkulainen, Katja Väyrynen, Kenichiro Mizohata, Jyrki Räisänen, Marko Vehkamäki, Mikko Ritala
2019
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Intercalation of Lithium Ions from Gaseous Precursors into β-MnO2 Thin Films Deposited by Atomic Layer Deposition
Heta Elisa Nieminen, Ville Miikkulainen, Daniel Settipani, Laura Simonelli, Philipp Hönicke, Claudia Zech, Yves Kayser, Burkhard Beckhoff, Ari Pekka Honkanen, Mikko J. Heikkilä, Kenichiro Mizohata, Kristoffer Meinander, Oili M.E. Ylivaara, Simo Huotari, Mikko Ritala
2019
Journal of Physical Chemistry C
Towards space-grade 3D-printed, ALD-coated small satellite propulsion components for fluidics
Antti Kestilä, Kalle Nordling, Ville Miikkulainen, Mikko Kaipio, Tuomas Tikka, Mika Salmi, Aleksi Auer, Markku Leskelä, Mikko Ritala
2018
Additive Manufacturing
(Invited) Photo-Assisted ALD
Ville Miikkulainen, Katja Väyrynen, Väinö Kilpi, Zhongmei Han, Marko Vehkamäki, Kenichiro Mizohata, Jyrki Räisänen, Mikko Kalervo Ritala
2017
ECS Transactions
TiO2 Photocatalysis-DESI-MS Rotating Array Platform for High-Throughput Investigation of Oxidation Reactions
Miina Maarit Hennikki Ruokolainen, Ville Miikkulainen, Mikko Kalervo Ritala, Tiina Marjukka Sikanen, Tapio Kotiaho, Risto Kalervo Kostiainen
2017
Analytical Chemistry
Enhanced process and composition control for atomic layer deposition with lithium trimethylsilanolate
Amund Ruud, Ville Miikkulainen, Kenichiro Mizohata, Helmer Fjellvag, Ola Nilsen
2017
JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY A
Studies of the Electrochemical Behavior of LiNi0.80Co0.15Al0.05O2 Electrodes Coated with LiAlO2
Onit Srur-Lavi, Ville Miikkulainen, Boris Markovsky, Judith Grinblat, Michael Talianker, Yafit Fleger, Gili Cohen-Taguri, Albert Mor, Yosef Tal-Yosef, Doron Aurbach
2017
Journal of the Electrochemical Society
Electrical characterization of amorphous LiAlO2 thin films deposited by atomic layer deposition
Y. Hu, A. Ruud, V. Miikkulainen, T. Norby, O. Nilsen, H. Fjellvåg
2016
RSC Advances
Nuclear reaction analysis for H, Li, Be, B, C, N, O and F with an RBS check
W. A. Lanford, M. Parenti, B. J. Nordell, M. M. Paquette, A. N. Caruso, M. Mäntymäki, J. Hämäläinen, M. Ritala, K. B. Klepper, V. Miikkulainen, O. Nilsen, W. Tenhaeff, N. Dudney, D. Koh, S. K. Banerjee, E. Mays, J. Bielefeld, S. W. King
2016
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Atomic Layer Deposited Hybrid Organic-Inorganic Aluminates as Potential Low-k Dielectric Materials
Karina B Klepper, Ville Miikkulainen, Ola Nilsen, Helmer Fjellvåg, Ming Liu, Dhanadeep Dutta, David Gidley, William Lanford, Liza Ross, Han Li, Sean W King
2015
Innovative Interconnects/Electrodes for Advanced Devices, Flexible and Green-Energy Electronics
Atomic layer deposited lithium aluminum oxide: (In)dependency of film properties from pulsing sequence
V. Miikkulainen, O. Nilsen, Han Li, S.W. King, Mikko Laitinen, Timo Sajavaara, H. Fjellvåg
2015
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Atomic layer deposition of spinel lithium manganese oxide by film-body-controlled lithium incorporation for thin-film lithium-ion batteries
V. Miikkulainen, A. Ruud, Erik Østreng, Ola Nilsen, Mikko Laitinen, Timo Sajavaara, Helmer Fjellvåg
2014
Journal of Physical Chemistry C
Erratum: Atomic layer deposition of spinel lithium manganese oxide by film-body-controlled lithium incorporation for thin-film lithium-ion batteries (J. Phys. Chem. C (2014) 118: 2 (1258-1268) DOI: 10.1021/jp409399y)
V. Miikkulainen, A. Ruud, Erik Østreng, Ola Nilsen, Mikko Laitinen, Timo Sajavaara, H. Fjellvåg
2014
Journal of Physical Chemistry C
Atomic layer deposition of functional films for Li-ion microbatteries
Ola Nilsen, V. Miikkulainen, K.B. Gandrud, Erik Østreng, A. Ruud
2014
Physica Status Solidi (A) Applications and Materials Science
Atomic layer deposition of LixTiyOz thin films
V. Miikkulainen, O. Nilsen, Mikko Laitinen, Timo Sajavaara, H. Fjellvåg
2013
RSC Advances
Crystallinity of inorganic films grown by atomic layer deposition
Ville Miikkulainen, Markku Leskelä, Mikko Ritala, Riikka L. Puurunen
2013
Journal of Applied Physics
Erratum: Atomic layer deposition of LixTiyO z thin films (RSC Advances (2013) 3 (7537-7542) DOI:10.1039/ C3RA40745D)
V. Miikkulainen, O. Nilsen, Mikko Laitinen, Timo Sajavaara, H. Fjellvåg
2013
RSC Advances
ALD of thin films for lithium ion batteries
Titta Aaltonen, V. Miikkulainen, K.B. Gandrud, A. Pettersen, O. Nilsen, H. Fjellvåg
2011
ECS Transactions
Controlling the Crystallinity and Roughness of Atomic Layer Deposited Titanium Dioxide Films
Riikka L. Puurunen, Timo Sajavaara, Eero Santala, Ville Miikkulainen, Tapio Saukkonen, Mikko Laitinen, Markku Leskelä
2011
Journal of Nanoscience and Nanotechnology
Effect of corona pre-treatment on the performance of gas barrier layers applied by atomic layer deposition onto polymer coated paperboard
Terhi Hirvikorpi, Mika Vähä-Nissi, Ali Harlin, Jaana Marles, Ville Miikkulainen, Maarit Karppinen
2010
Applied Surface Science
Atomic layer deposition as pore diameter adjustment tool for nanoporous aluminum oxide injection molding masks
V. Miikkulainen, T. Rasilainen, E. Puukilainen, M. Suvanto, Tapani A. Pakkanen
2008
Langmuir
Bis(tert-butylimido)-bis(dialkylamido) complexes of molybdenum as atomic layer deposition (ALD) precursors for molybdenum nitride: The effect of the alkyl group
V. Miikkulainen, Mika Suvanto, Tapani A. Pakkanen
2008
Chemical Vapor Deposition
Molybdenum nitride nanotubes
V. Miikkulainen, M. Suvanto, T.A. Pakkanen
2008
Thin Solid Films
Thin films of MoN, WN, and perfluorinated silane deposited from dimethylamido precursors as contamination resistant coatings on micro-injection mold inserts
V. Miikkulainen, Mika Suvanto, Tapani A. Pakkanen, Samuli Siitonen, P. Karvinen, Markku Kuittinen, Hannu Kisonen
2008
Surface and Coatings Technology
Atomic layer deposition of molybdenum nitride from bis(tert-butylimido)- bis(dimethylamido)molybdenum and ammonia onto several types of substrate materials with equal growth per cycle
V. Miikkulainen, Mika Suvanto, T.A. Pakkanen
2007
Chemistry of Materials
Mono- and heterometallic carbonyl precursor based RuMo/Al<inf>2</inf>O<inf>3</inf> catalysts: Hydrodesulfurization activity and temperature programmed studies
Patrícia Pinto, Maria José Calhorda, T. Straub, V. Miikkulainen, Jarkko Räty, M. Suvanto, T.A. Pakkanen
2001
Journal of Molecular Catalysis A: Chemical