Public defence in Materials Science, M.Sc. (Tech.) Jarkko Etula

Title of the thesis: Exploring the envelope of physical vapor deposition: Nano- and microstructured films for electrochemical applications

Doctoral student: M.Sc. (Tech.) Jarkko Etula
Opponent: Professor Kostas Sarakinos, University of Helsinki, Finland
Custos: Professsor Tomi Laurila, Aalto University School of Chemical Engineering, Department of Chemistry and Materials Science

Direct fabrication of microstructured films for electrochemical applications by physical vapor deposition

Physical vapor deposition (PVD) is a widely used method in the industry for producing high-quality films with flat surfaces. However, when these films are used as electrodes in electrochemistry, their smooth surfaces limit electrochemical performance because there is less surface area available for chemical reactions.
In the first part, the nanostructure of PVD deposited flat carbon films is modified to improve their performance in electrochemical sensing applications. In the second part, the PVD method is further adapted to create titanium oxide films with large surface areas and exotic microstructures, ideal for applications like photocatalysis and microbatteries. This work introduces novel PVD methods and phenomena, enabling the direct fabrication of large microstructures not typically achievable with conventional PVD methods. These discoveries and insights push the boundaries of what can be achieved with PVD methods.
 

Thesis available for public display 10 days prior to the defence

Contact information:
M.Sc. (Tech.) Jarkko Etula
[email protected] 

Doctoral theses in the School of Chemical Engineering