Public defence in Micro- and Nanotechnology, M.Sc. Shuo Li

The title of the thesis: Integration of Atomic Layer Deposited Al2O3 as surface passivation layer into Silicon Solar Cell

Doctoral student: Shuo Li
Opponent: Prof. Zeguo Tang, Shenzhen Technology University, China
Custos: Prof. Hele Savin, Aalto University School of Electrical Engineering, Department of Electronics and Nanoengineering

The purpose of this study was to integrate the ALD Al2O3 into the industrial scale manufacture of silicon solar cell. This thesis focused to solve the problems found in the mass production of silicon solar cell, such as the blistering after the firing, influence of ALD precursors, the substrates storage condition and Si surface pretreatment method. The study proposed a solution for passivating the industrial silicon solar cell and integrating it ALD Al2O3 into the existing production process. As a conclusion, ALD is a promissing method to be used in the industrial silicon solar cell manufacture.

Thesis available for public display 10 days prior to the defence at: https://aaltodoc.aalto.fi/doc_public/eonly/riiputus/

Contact information:

See also:

• Doctoral theses in the School of Electrical Engineering: https://aaltodoc.aalto.fi/handle/123456789/53
• Zoom Quick Guide: https://www.aalto.fi/en/services/zoom-quick-guide